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On-mask mismatch resistor structures for the characterisation of maskmaking capability

On-mask mismatch resistor structures for the characterisation of maskmaking capability

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Authors

  • S. Smith
  • A Tsiamis
  • M. McCallum
  • A.C. Hourd
  • J.T.M. Stevenson
  • A.J. Walton
  • S. Enderling

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Info

Original languageEnglish
Title of host publicationIEEE International Conference on Microelectronic Test Structures
PublisherIEEE Computer Society
Publication date2008
Pages228-232
Number of pages5
ISBN (Electronic)9781424418015
ISBN (Print)9781424418008
DOIs
StatePublished

Conference

ConferenceIEEE Conference on Microelectronic Test Structures
CountryUnited Kingdom
CityEdinburgh
Period24/03/0827/03/08

Abstract

This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time. © 2008 IEEE.

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