A microstructure for detecting the stress distribution in thin coatings deposited on to silicon substrates

Robert P. Keatch, Brian Lawrenson

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    Abstract

    A microscopic gauge is described which may be used for detecting and measuring the stress which is present in thin coatings which are deposited on to silicon substrates. An array of these structures may be formed on the substrate by means of microengineering fabrication processes, and this enables the uniformity of the stress to be mapped. Evaluation is made from an SEM photomicrograph.

    Original languageEnglish
    Pages (from-to)393-400
    Number of pages8
    JournalMicroelectronics Journal
    Volume25
    Issue number5
    DOIs
    Publication statusPublished - 1994

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