A microstructure for detecting the stress distribution in thin coatings deposited on to silicon substrates

Robert P. Keatch, Brian Lawrenson

    Research output: Contribution to journalArticlepeer-review

    8 Citations (Scopus)


    A microscopic gauge is described which may be used for detecting and measuring the stress which is present in thin coatings which are deposited on to silicon substrates. An array of these structures may be formed on the substrate by means of microengineering fabrication processes, and this enables the uniformity of the stress to be mapped. Evaluation is made from an SEM photomicrograph.

    Original languageEnglish
    Pages (from-to)393-400
    Number of pages8
    JournalMicroelectronics Journal
    Issue number5
    Publication statusPublished - 1994

    Cite this