A microstructure for detecting the stress distribution in thin coatings deposited on to silicon substrates

TY - JOUR

T1 - A microstructure for detecting the stress distribution in thin coatings deposited on to silicon substrates

AU - Keatch, Robert P.

AU - Lawrenson, Brian

PY - 1994

Y1 - 1994

N2 - A microscopic gauge is described which may be used for detecting and measuring the stress which is present in thin coatings which are deposited on to silicon substrates. An array of these structures may be formed on the substrate by means of microengineering fabrication processes, and this enables the uniformity of the stress to be mapped. Evaluation is made from an SEM photomicrograph.

AB - A microscopic gauge is described which may be used for detecting and measuring the stress which is present in thin coatings which are deposited on to silicon substrates. An array of these structures may be formed on the substrate by means of microengineering fabrication processes, and this enables the uniformity of the stress to be mapped. Evaluation is made from an SEM photomicrograph.

UR - http://discovery.dundee.ac.uk/portal/en/research/a-microstructure-for-detecting-the-stress-distribution-in-thin-coatings-deposited-on-to-silicon-substrates(74260215-f9fe-407a-a522-263ceb648b35).html

U2 - 10.1016/0026-2692(94)90086-8

DO - 10.1016/0026-2692(94)90086-8

M3 - Article

SN - 0026-2692

VL - 25

SP - 393

EP - 400

JO - Microelectronics Journal

JF - Microelectronics Journal

IS - 5

ER -