A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist

Saydulla Persheyev, Mervyn John Rose

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    Abstract

    SU8 Negative photoresist is finding high demand in applications such as MEMS sensors and waveguides. The possibility of photolithographic patterning and high physical and dielectric properties are attracting ever more users among workers in the electronics industry and increasingly in biomedical applications. In our work we employ an original method of exposing of SU8 and create high aspect ratio structures on glass and other substrates. Dry plasma etching results of negative epoxy-based photoresist by Inductively Coupled Plasma system using gases O and CF are presented.
    Original languageEnglish
    Title of host publicationMaterials Research Society Symposium Proceedings
    Pages63-67
    Number of pages5
    Volume1272
    DOIs
    Publication statusPublished - 2010

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    Persheyev, S., & Rose, M. J. (2010). A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist. In Materials Research Society Symposium Proceedings (Vol. 1272, pp. 63-67) https://doi.org/10.1557/PROC-1272-KK09-07