A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist

Saydulla Persheyev, Mervyn John Rose

    Research output: Chapter in Book/Report/Conference proceedingOther chapter contribution

    1 Citation (Scopus)

    Abstract

    SU8 Negative photoresist is finding high demand in applications such as MEMS sensors and waveguides. The possibility of photolithographic patterning and high physical and dielectric properties are attracting ever more users among workers in the electronics industry and increasingly in biomedical applications. In our work we employ an original method of exposing of SU8 and create high aspect ratio structures on glass and other substrates. Dry plasma etching results of negative epoxy-based photoresist by Inductively Coupled Plasma system using gases O and CF are presented.
    Original languageEnglish
    Title of host publicationMaterials Research Society Symposium Proceedings
    Pages63-67
    Number of pages5
    Volume1272
    DOIs
    Publication statusPublished - 2010

    Fingerprint

    Photoresists
    Aspect ratio
    Plasma etching
    Electronics industry
    Inductively coupled plasma
    Dielectric properties
    MEMS
    Waveguides
    Physical properties
    Glass
    Sensors
    Substrates
    Gases

    Cite this

    Persheyev, S., & Rose, M. J. (2010). A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist. In Materials Research Society Symposium Proceedings (Vol. 1272, pp. 63-67) https://doi.org/10.1557/PROC-1272-KK09-07
    Persheyev, Saydulla ; Rose, Mervyn John. / A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist. Materials Research Society Symposium Proceedings. Vol. 1272 2010. pp. 63-67
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    Persheyev, S & Rose, MJ 2010, A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist. in Materials Research Society Symposium Proceedings. vol. 1272, pp. 63-67. https://doi.org/10.1557/PROC-1272-KK09-07

    A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist. / Persheyev, Saydulla; Rose, Mervyn John.

    Materials Research Society Symposium Proceedings. Vol. 1272 2010. p. 63-67.

    Research output: Chapter in Book/Report/Conference proceedingOther chapter contribution

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    BT - Materials Research Society Symposium Proceedings

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    Persheyev S, Rose MJ. A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist. In Materials Research Society Symposium Proceedings. Vol. 1272. 2010. p. 63-67 https://doi.org/10.1557/PROC-1272-KK09-07