A new method of manufacturing high speed aspect ratio structures using SU8 negative photoresist

Keyphrases

• Aspect Ratio 100%
• Negative Photoresist 100%
• Manufacturing Methods 100%
• Physical Properties 50%
• Biomedical Applications 50%
• Photolithography Patterning 50%
• Waveguide 50%
• High Demand 50%
• MEMS Sensor 50%
• Plasma Etching 50%
• Plasma System 50%
• Dielectric Properties 50%
• Electronics Industry 50%
• High Aspect Ratio Structure 50%
• Photoresist 50%
• Original Method 50%
• Epoxy-based 50%
• Inductively Coupled Plasma 50%
• Gasses 50%

Material Science

• Physical Property 100%
• Microelectromechanical System 100%
• Plasma Etching 100%
• Dielectric Property 100%
• Waveguide 100%