TY - CHAP
T1 - Comparison of measurement techniques for advanced photomask metrology
AU - Smith, S.
AU - Tsiamis, A.
AU - Stevenson, J.T.M.
AU - Walton, A.J.
AU - McCallum, M.
AU - Hourd, A.C.
AU - Dixson, R.G.
AU - Allen, R.A.
AU - Potzick, J.E.
AU - Cresswell, M.W.
AU - Orji, N.G.
PY - 2008
Y1 - 2008
N2 - This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
AB - This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
UR - http://www.scopus.com/inward/record.url?scp=51349096611&partnerID=8YFLogxK
U2 - 10.1109/ICMTS.2008.4509311
DO - 10.1109/ICMTS.2008.4509311
M3 - Other chapter contribution
AN - SCOPUS:51349096611
SN - 9781424418008
SP - 35
EP - 39
BT - IEEE International Conference on Microelectronic Test Structures
ER -