This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
|Title of host publication||IEEE International Conference on Microelectronic Test Structures|
|Number of pages||5|
|Publication status||Published - 2008|