Comparison of measurement techniques for advanced photomask metrology

S. Smith, A. Tsiamis, J.T.M. Stevenson, A.J. Walton, M. McCallum, A.C. Hourd, R.G. Dixson, R.A. Allen, J.E. Potzick, M.W. Cresswell, N.G. Orji

    Research output: Chapter in Book/Report/Conference proceedingOther chapter contribution

    2 Citations (Scopus)

    Abstract

    This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
    Original languageEnglish
    Title of host publicationIEEE International Conference on Microelectronic Test Structures
    Pages35-39
    Number of pages5
    ISBN (Electronic)9781424418015
    DOIs
    Publication statusPublished - 2008

    Fingerprint

    photomasks
    electrical measurement
    metrology
    atomic force microscopy
    optical measurement
    chromium
    masks
    quartz

    Cite this

    Smith, S., Tsiamis, A., Stevenson, J. T. M., Walton, A. J., McCallum, M., Hourd, A. C., ... Orji, N. G. (2008). Comparison of measurement techniques for advanced photomask metrology. In IEEE International Conference on Microelectronic Test Structures (pp. 35-39) https://doi.org/10.1109/ICMTS.2008.4509311
    Smith, S. ; Tsiamis, A. ; Stevenson, J.T.M. ; Walton, A.J. ; McCallum, M. ; Hourd, A.C. ; Dixson, R.G. ; Allen, R.A. ; Potzick, J.E. ; Cresswell, M.W. ; Orji, N.G. / Comparison of measurement techniques for advanced photomask metrology. IEEE International Conference on Microelectronic Test Structures. 2008. pp. 35-39
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    author = "S. Smith and A. Tsiamis and J.T.M. Stevenson and A.J. Walton and M. McCallum and A.C. Hourd and R.G. Dixson and R.A. Allen and J.E. Potzick and M.W. Cresswell and N.G. Orji",
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    Smith, S, Tsiamis, A, Stevenson, JTM, Walton, AJ, McCallum, M, Hourd, AC, Dixson, RG, Allen, RA, Potzick, JE, Cresswell, MW & Orji, NG 2008, Comparison of measurement techniques for advanced photomask metrology. in IEEE International Conference on Microelectronic Test Structures. pp. 35-39. https://doi.org/10.1109/ICMTS.2008.4509311

    Comparison of measurement techniques for advanced photomask metrology. / Smith, S.; Tsiamis, A.; Stevenson, J.T.M.; Walton, A.J.; McCallum, M.; Hourd, A.C.; Dixson, R.G.; Allen, R.A.; Potzick, J.E.; Cresswell, M.W.; Orji, N.G.

    IEEE International Conference on Microelectronic Test Structures. 2008. p. 35-39.

    Research output: Chapter in Book/Report/Conference proceedingOther chapter contribution

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    Smith S, Tsiamis A, Stevenson JTM, Walton AJ, McCallum M, Hourd AC et al. Comparison of measurement techniques for advanced photomask metrology. In IEEE International Conference on Microelectronic Test Structures. 2008. p. 35-39 https://doi.org/10.1109/ICMTS.2008.4509311