This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
|Title of host publication||IEEE International Conference on Microelectronic Test Structures|
|Number of pages||5|
|Publication status||Published - 2008|
Smith, S., Tsiamis, A., Stevenson, J. T. M., Walton, A. J., McCallum, M., Hourd, A. C., Dixson, R. G., Allen, R. A., Potzick, J. E., Cresswell, M. W., & Orji, N. G. (2008). Comparison of measurement techniques for advanced photomask metrology. In IEEE International Conference on Microelectronic Test Structures (pp. 35-39) https://doi.org/10.1109/ICMTS.2008.4509311