Comparison of measurement techniques for advanced photomask metrology

S. Smith, A. Tsiamis, J.T.M. Stevenson, A.J. Walton, M. McCallum, A.C. Hourd, R.G. Dixson, R.A. Allen, J.E. Potzick, M.W. Cresswell, N.G. Orji

    Research output: Chapter in Book/Report/Conference proceedingOther chapter contribution

    2 Citations (Scopus)

    Abstract

    This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.
    Original languageEnglish
    Title of host publicationIEEE International Conference on Microelectronic Test Structures
    Pages35-39
    Number of pages5
    ISBN (Electronic)9781424418015
    DOIs
    Publication statusPublished - 2008

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  • Cite this

    Smith, S., Tsiamis, A., Stevenson, J. T. M., Walton, A. J., McCallum, M., Hourd, A. C., Dixson, R. G., Allen, R. A., Potzick, J. E., Cresswell, M. W., & Orji, N. G. (2008). Comparison of measurement techniques for advanced photomask metrology. In IEEE International Conference on Microelectronic Test Structures (pp. 35-39) https://doi.org/10.1109/ICMTS.2008.4509311