Comparison of measurement techniques for advanced photomask metrology

TY - CHAP

T1 - Comparison of measurement techniques for advanced photomask metrology

AU - Smith, S.

AU - Tsiamis, A.

AU - Stevenson, J.T.M.

AU - Walton, A.J.

AU - McCallum, M.

AU - Hourd, A.C.

AU - Dixson, R.G.

AU - Allen, R.A.

AU - Potzick, J.E.

AU - Cresswell, M.W.

AU - Orji, N.G.

PY - 2008

Y1 - 2008

N2 - This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.

AB - This paper compares electrical, optical and AFM measurements of critical dimension (CD) made on a chrome on quartz photomask. Test structures suitable for direct, on-mask electrical probing have been measured using the three techniques and the results show very good agreement between the electrical measurements and those made with a calibrated CD-AFM system.

UR - https://www.scopus.com/pages/publications/51349096611

U2 - 10.1109/ICMTS.2008.4509311

DO - 10.1109/ICMTS.2008.4509311

M3 - Other chapter contribution

AN - SCOPUS:51349096611

SN - 9781424418008

SP - 35

EP - 39

BT - IEEE International Conference on Microelectronic Test Structures

ER -