Comparison of measurement techniques for linewidth metrology on advanced photomasks

Keyphrases

• Metrology 100%
• Measurement Techniques 100%
• Electrical Measurements 100%
• Photomask 100%
• Measurement Comparison 100%
• Atomic Force Microscope 50%
• Silica 50%
• Optical Forces 50%
• Electrical Forces 50%
• Uncertainty Levels 50%
• Uncertainty Sources 50%
• Resistors 50%
• Chrome 50%
• Cross-bridge 50%
• Kelvin Bridge 50%
• Critical Dimension Atomic Force Microscope 50%
• Optical Metrology 50%
• Metrology System 50%
• Binary Photomask 50%
• Electrical Probe 50%
• Microscopy System 50%
• Microscope Measurement 50%

Engineering

• Critical Dimension 100%
• Atomic Force Microscope 66%
• Electrical Measurement 66%
• Good Agreement 33%
• Test Structure 33%
• Silicon Dioxide 33%