Controlling roughness: From etching to nanotexturing and plasma-directed organization on organic and inorganic materials

Evangelos Gogolides, Vassilios Constantoudis, George Kokkoris, Dimitrios Kontziampasis, Katerina Tsougeni, George Boulousis, Marilena Vlachopoulou, Angeliki Tserepi

Research output: Contribution to journalArticlepeer-review

110 Citations (Scopus)
31 Downloads (Pure)

Abstract

We describe how plasma-wall interactions in etching plasmas lead to either random roughening/nanotexturing of polymeric and silicon surfaces, or formation of organized nanostructures on such surfaces. We conduct carefully designed experiments of plasma-wall interactions to understand the causes of both phenomena, and present Monte Carlo simulation results confirming the experiments. We discuss emerging applications in wetting and optical property control, protein immobilisation, microfluidics and lab-on-a-chip fabrication and modification, and cost-effective silicon mould fabrication. We conclude with an outlook on the plasma reactor future designs to take advantage of the observed phenomena for new micro- and nanomanufacturing processes, and new contributions to plasma nanoassembly.

Original languageEnglish
Article number174021
JournalJournal of Physics D: Applied Physics
Volume44
Issue number17
Early online date14 Apr 2011
DOIs
Publication statusPublished - 4 May 2011

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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