Fidelity comparison of phase masks for hybrid imaging

Tom Vettenburg, Andy Wood, Nicholas Bustin, Andrew R. Harvey

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A significantly increased defocus tolerance can be obtained by combining pupil phase-modulation with digital demodulation in a hybrid imaging system. Designing the optimal pupil phase-modulation is however not a trivial task. We show how hybrid imaging fidelity can be predicted and used to compare arbitrary phase-modulations. The evaluations of two anti-symmetric and a symmetric phase-modulation yield initial design values that can be used for the optimization of specific hybrid designs.

Original languageEnglish
Title of host publicationInternational Optical Design Conference 2010
DOIs
Publication statusPublished - 2010
EventInternational Optical Design Conference 2010 - Jackson Hole, WY, United States
Duration: 13 Jun 201017 Jun 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7652
ISSN (Print)0277-786X

Conference

ConferenceInternational Optical Design Conference 2010
CountryUnited States
CityJackson Hole, WY
Period13/06/1017/06/10

Keywords

  • aberration control
  • Computational imaging
  • defocus
  • design optimization
  • hybrid optical-digital imaging
  • phase mask
  • PSF-engineering
  • pupil-phase engineering
  • wavefront-coding

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