Investigation of electrical and optical CD measurement techniques for the characterisation of on-mask GHOST proximity corrected features

A. Tsiamis, S. Smith, J.T.M. Stevenson, A.J. Walton, M. McCallum, A.C. Hourd, O. Toublan

    Research output: Chapter in Book/Report/Conference proceedingOther chapter contribution

    5 Citations (Scopus)

    Abstract

    This paper reports the measurement results from a set of electrical, on-mask test structures based on industry standard test feature layouts normally used to investigate process proximity effects and improve optical proximity correction (OPC) models. The electrical test structures were fabricated on a binary photomask using the GHOST proximity correction technique to compensate for typical e-beam induced proximity errors. This is one of the first times that electrical test structures have been used to evaluate GHOST exposure. The test structures were measured electrically and optically with a dedicated photomask metrology tool and the results from the two techniques are presented.
    Original languageEnglish
    Title of host publicationIEEE International Conference on Microelectronic Test Structures
    PublisherIEEE Computer Society
    Pages29-34
    Number of pages6
    ISBN (Electronic)9781424418015
    ISBN (Print)9781424418008
    DOIs
    Publication statusPublished - 2 May 2008

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