Metastability in undoped microcrystalline silicon thin films deposited by HWCVD

S. K. Persheyev; K. A. O'Neill; S. Anthony; M. J. Rose; V. Smirnov; S. Reynolds

Metastability in undoped microcrystalline silicon thin films deposited by HWCVD

S. K. Persheyev
, K. A. O'Neill
, S. Anthony
, M. J. Rose
, V. Smirnov
, S. Reynolds

Research output: Chapter in Book/Report/Conference proceeding › Chapter (peer-reviewed)

Original language	English
Title of host publication	Amorphous and nanocrystalline silicon science and technology--2004
Subtitle of host publication	symposium held April 13-16, 2004, San Francisco, California, U.S.A.
Editors	Gautam Ganguly
Place of Publication	Warrendale, Pa
Publisher	Materials Research Society
Pages	41-46
Number of pages	6
Volume	808
ISBN (Print)	155899758X
Publication status	Published - 2004
Event	Symposium A: Amorphous and Nanocrystalline Silicon Science and Technology - San Francisco, United States Duration: 12 Apr 2004 → 16 Apr 2004 http://www.mrs.org/s04-program-a/

Conference

Conference	Symposium A: Amorphous and Nanocrystalline Silicon Science and Technology
Country/Territory	United States
City	San Francisco
Period	12/04/04 → 16/04/04
Internet address	http://www.mrs.org/s04-program-a/

Access to Document

http://www.mrs.org/s04-program-a/

Cite this

Persheyev, S. K., O'Neill, K. A., Anthony, S., Rose, M. J., Smirnov, V., & Reynolds, S. (2004). Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. In G. Ganguly (Ed.), Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A. (Vol. 808, pp. 41-46). Materials Research Society. http://www.mrs.org/s04-program-a/

@inbook{900c02a499dc4f54a99203dddf12fd43,

title = "Metastability in undoped microcrystalline silicon thin films deposited by HWCVD",

author = "Persheyev, \{S. K.\} and O'Neill, \{K. A.\} and S. Anthony and Rose, \{M. J.\} and V. Smirnov and S. Reynolds",

year = "2004",

language = "English",

isbn = "155899758X",

volume = "808",

pages = "41--46",

editor = "Gautam Ganguly",

booktitle = "Amorphous and nanocrystalline silicon science and technology--2004",

publisher = "Materials Research Society",

note = "Symposium A: Amorphous and Nanocrystalline Silicon Science and Technology ; Conference date: 12-04-2004 Through 16-04-2004",

url = "http://www.mrs.org/s04-program-a/",

}

Persheyev, SK, O'Neill, KA, Anthony, S, Rose, MJ, Smirnov, V & Reynolds, S 2004, Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. in G Ganguly (ed.), Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A.. vol. 808, Materials Research Society, Warrendale, Pa, pp. 41-46, Symposium A: Amorphous and Nanocrystalline Silicon Science and Technology, San Francisco, United States, 12/04/04. <http://www.mrs.org/s04-program-a/>

Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. / Persheyev, S. K.; O'Neill, K. A.; Anthony, S. et al.
Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A.. ed. / Gautam Ganguly. Vol. 808 Warrendale, Pa: Materials Research Society, 2004. p. 41-46.

Research output: Chapter in Book/Report/Conference proceeding › Chapter (peer-reviewed)

TY - CHAP

T1 - Metastability in undoped microcrystalline silicon thin films deposited by HWCVD

AU - Persheyev, S. K.

AU - O'Neill, K. A.

AU - Anthony, S.

AU - Rose, M. J.

AU - Smirnov, V.

AU - Reynolds, S.

PY - 2004

Y1 - 2004

M3 - Chapter (peer-reviewed)

SN - 155899758X

VL - 808

SP - 41

EP - 46

BT - Amorphous and nanocrystalline silicon science and technology--2004

A2 - Ganguly, Gautam

PB - Materials Research Society

CY - Warrendale, Pa

T2 - Symposium A: Amorphous and Nanocrystalline Silicon Science and Technology

Y2 - 12 April 2004 through 16 April 2004

ER -

Persheyev SK, O'Neill KA, Anthony S, Rose MJ, Smirnov V, Reynolds S. Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. In Ganguly G, editor, Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A.. Vol. 808. Warrendale, Pa: Materials Research Society. 2004. p. 41-46