Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield

Amin Abdolvand (Inventor)

Research output: Patent

Abstract

A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series oflaser pulses and the power density of the pulses is in a range 0.01 TW/cm2 to 3 TW/cm2, optionally 0.1 TW/cm2 to 3 TW/cm2.
Original languageEnglish
Patent numberWO2016/207660 A1
IPCB23K 26/00 (2014.01)
Priority date24/06/15
Filing date24/06/16
Publication statusPublished - 29 Dec 2016

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Abdolvand, A. (2016). IPC No. B23K 26/00 (2014.01). Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield. (Patent No. WO2016/207660 A1).