Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield

Amin Abdolvand

Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield

Research output: Patent

Abstract

A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series oflaser pulses and the power density of the pulses is in a range 0.01 TW/cm² to 3 TW/cm², optionally 0.1 TW/cm2 to 3 TW/cm².

Original language	English
Patent number	WO2016/207660 A1
IPC	B23K 26/00 (2014.01)
Priority date	24/06/15
Filing date	24/06/16
Publication status	Published - 29 Dec 2016

Cite this

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title = "Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield",

abstract = "A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series oflaser pulses and the power density of the pulses is in a range 0.01 TW/cm2 to 3 TW/cm2, optionally 0.1 TW/cm2 to 3 TW/cm2.",

author = "Amin Abdolvand",

year = "2016",

month = dec,

day = "29",

language = "English",

type = "Patent",

note = "WO2016/207660 A1; B23K 26/00 (2014.01)",

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T1 - Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield

AU - Abdolvand, Amin

PY - 2016/12/29

Y1 - 2016/12/29

N2 - A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series oflaser pulses and the power density of the pulses is in a range 0.01 TW/cm2 to 3 TW/cm2, optionally 0.1 TW/cm2 to 3 TW/cm2.

AB - A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series oflaser pulses and the power density of the pulses is in a range 0.01 TW/cm2 to 3 TW/cm2, optionally 0.1 TW/cm2 to 3 TW/cm2.

UR - https://patentscope.wipo.int/search/en/detail.jsf?docId=WO2016207660&recNum=4&office=&queryString=FP%3A%28Method+of%2C+and+apparatus+for%2C+reducing+photoelectron+yield+and%2For+secondary+electron+yield%29&prevFilter=&sortOption=Pub+Date+Desc&maxRec=5

M3 - Patent

M1 - WO2016/207660 A1

Y2 - 2016/06/24

ER -

Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield

Abstract

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