Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield

TY - PAT

T1 - Method of, and apparatus for, reducing photoelectron yield and/or secondary electron yield

AU - Abdolvand, Amin

PY - 2016/12/29

Y1 - 2016/12/29

N2 - A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series oflaser pulses and the power density of the pulses is in a range 0.01 TW/cm2 to 3 TW/cm2, optionally 0.1 TW/cm2 to 3 TW/cm2.

AB - A method of reducing photoelectron yield (PEY) and/or secondary electron yield (SEY) of a surface of a target (10), comprises applying laser radiation to the surface of the target (10) to produce a periodic arrangement of structures on the surface, wherein the laser radiation comprises pulsed laser radiation comprising a series oflaser pulses and the power density of the pulses is in a range 0.01 TW/cm2 to 3 TW/cm2, optionally 0.1 TW/cm2 to 3 TW/cm2.

UR - https://patentscope.wipo.int/search/en/detail.jsf?docId=WO2016207660&recNum=4&office=&queryString=FP%3A%28Method+of%2C+and+apparatus+for%2C+reducing+photoelectron+yield+and%2For+secondary+electron+yield%29&prevFilter=&sortOption=Pub+Date+Desc&maxRec=5

M3 - Patent

M1 - WO2016/207660 A1

Y2 - 2016/06/24

ER -