Methylsilane on Cu(1 1 1): A MDS study of the formation of the surface silicide

Hervé Ménard, Andrew Pratt, Marcus Jacka (Lead / Corresponding author)

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

The adsorption of methylsilane on Cu(1 1 1) has been investigated by metastable deexcitation spectroscopy. The deexcitation process for the clean copper and silicide surfaces was demonstrated to occur via resonance ionization followed by Auger neutralization, while upon the adsorption of methylsilane at 295 K it changes to Auger deexcitation. Accompanied by ultraviolet photoelectron spectroscopy, the MD spectrum at 295 K reveals the presence of a methyl group on the surface, supporting the assertion that the majority of the surface is covered with methylsilane fragments. Annealing the surface above 420 K reveals the presence of clean copper sites on a partially silicide surface.

Original languageEnglish
Pages (from-to)434-438
Number of pages5
JournalChemical Physics Letters
Volume412
Issue number4-6
DOIs
Publication statusPublished - 5 Sep 2005

Fingerprint Dive into the research topics of 'Methylsilane on Cu(1 1 1): A MDS study of the formation of the surface silicide'. Together they form a unique fingerprint.

Cite this