TY - JOUR
T1 - Methylsilane on Cu(1 1 1)
T2 - A MDS study of the formation of the surface silicide
AU - Ménard, Hervé
AU - Pratt, Andrew
AU - Jacka, Marcus
N1 - We acknowledge the Engineering and Physical Sciences Research Council for the funding of this research. We also thank Professor J.A.D. Matthew and Dr. S.P. Tear for helpful discussion.
PY - 2005/9/5
Y1 - 2005/9/5
N2 - The adsorption of methylsilane on Cu(1 1 1) has been investigated by metastable deexcitation spectroscopy. The deexcitation process for the clean copper and silicide surfaces was demonstrated to occur via resonance ionization followed by Auger neutralization, while upon the adsorption of methylsilane at 295 K it changes to Auger deexcitation. Accompanied by ultraviolet photoelectron spectroscopy, the MD spectrum at 295 K reveals the presence of a methyl group on the surface, supporting the assertion that the majority of the surface is covered with methylsilane fragments. Annealing the surface above 420 K reveals the presence of clean copper sites on a partially silicide surface.
AB - The adsorption of methylsilane on Cu(1 1 1) has been investigated by metastable deexcitation spectroscopy. The deexcitation process for the clean copper and silicide surfaces was demonstrated to occur via resonance ionization followed by Auger neutralization, while upon the adsorption of methylsilane at 295 K it changes to Auger deexcitation. Accompanied by ultraviolet photoelectron spectroscopy, the MD spectrum at 295 K reveals the presence of a methyl group on the surface, supporting the assertion that the majority of the surface is covered with methylsilane fragments. Annealing the surface above 420 K reveals the presence of clean copper sites on a partially silicide surface.
U2 - 10.1016/j.cplett.2005.07.039
DO - 10.1016/j.cplett.2005.07.039
M3 - Article
AN - SCOPUS:23944511108
SN - 0009-2614
VL - 412
SP - 434
EP - 438
JO - Chemical Physics Letters
JF - Chemical Physics Letters
IS - 4-6
ER -