Methylsilane on Cu(1 1 1): A MDS study of the formation of the surface silicide

Hervé Ménard; Andrew Pratt; Marcus Jacka

doi:10.1016/j.cplett.2005.07.039

Methylsilane on Cu(1 1 1): A MDS study of the formation of the surface silicide

Hervé Ménard
, Andrew Pratt
, Marcus Jacka (Lead / Corresponding author)

Centre for Anatomy and Human Identification

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

The adsorption of methylsilane on Cu(1 1 1) has been investigated by metastable deexcitation spectroscopy. The deexcitation process for the clean copper and silicide surfaces was demonstrated to occur via resonance ionization followed by Auger neutralization, while upon the adsorption of methylsilane at 295 K it changes to Auger deexcitation. Accompanied by ultraviolet photoelectron spectroscopy, the MD spectrum at 295 K reveals the presence of a methyl group on the surface, supporting the assertion that the majority of the surface is covered with methylsilane fragments. Annealing the surface above 420 K reveals the presence of clean copper sites on a partially silicide surface.

Original language	English
Pages (from-to)	434-438
Number of pages	5
Journal	Chemical Physics Letters
Volume	412
Issue number	4-6
DOIs	https://doi.org/10.1016/j.cplett.2005.07.039
Publication status	Published - 5 Sept 2005

ASJC Scopus subject areas

General Physics and Astronomy
Physical and Theoretical Chemistry

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10.1016/j.cplett.2005.07.039

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@article{a73609b505a24ed3bec2942b6f1d3a93,

title = "Methylsilane on Cu(1 1 1): A MDS study of the formation of the surface silicide",

abstract = "The adsorption of methylsilane on Cu(1 1 1) has been investigated by metastable deexcitation spectroscopy. The deexcitation process for the clean copper and silicide surfaces was demonstrated to occur via resonance ionization followed by Auger neutralization, while upon the adsorption of methylsilane at 295 K it changes to Auger deexcitation. Accompanied by ultraviolet photoelectron spectroscopy, the MD spectrum at 295 K reveals the presence of a methyl group on the surface, supporting the assertion that the majority of the surface is covered with methylsilane fragments. Annealing the surface above 420 K reveals the presence of clean copper sites on a partially silicide surface.",

author = "Herv{\'e} M{\'e}nard and Andrew Pratt and Marcus Jacka",

note = "We acknowledge the Engineering and Physical Sciences Research Council for the funding of this research. We also thank Professor J.A.D. Matthew and Dr. S.P. Tear for helpful discussion.",

year = "2005",

month = sep,

day = "5",

doi = "10.1016/j.cplett.2005.07.039",

language = "English",

volume = "412",

pages = "434--438",

journal = "Chemical Physics Letters",

issn = "0009-2614",

publisher = "Elsevier",

number = "4-6",

}

TY - JOUR

T1 - Methylsilane on Cu(1 1 1)

T2 - A MDS study of the formation of the surface silicide

AU - Ménard, Hervé

AU - Pratt, Andrew

AU - Jacka, Marcus

N1 - We acknowledge the Engineering and Physical Sciences Research Council for the funding of this research. We also thank Professor J.A.D. Matthew and Dr. S.P. Tear for helpful discussion.

PY - 2005/9/5

Y1 - 2005/9/5

N2 - The adsorption of methylsilane on Cu(1 1 1) has been investigated by metastable deexcitation spectroscopy. The deexcitation process for the clean copper and silicide surfaces was demonstrated to occur via resonance ionization followed by Auger neutralization, while upon the adsorption of methylsilane at 295 K it changes to Auger deexcitation. Accompanied by ultraviolet photoelectron spectroscopy, the MD spectrum at 295 K reveals the presence of a methyl group on the surface, supporting the assertion that the majority of the surface is covered with methylsilane fragments. Annealing the surface above 420 K reveals the presence of clean copper sites on a partially silicide surface.

AB - The adsorption of methylsilane on Cu(1 1 1) has been investigated by metastable deexcitation spectroscopy. The deexcitation process for the clean copper and silicide surfaces was demonstrated to occur via resonance ionization followed by Auger neutralization, while upon the adsorption of methylsilane at 295 K it changes to Auger deexcitation. Accompanied by ultraviolet photoelectron spectroscopy, the MD spectrum at 295 K reveals the presence of a methyl group on the surface, supporting the assertion that the majority of the surface is covered with methylsilane fragments. Annealing the surface above 420 K reveals the presence of clean copper sites on a partially silicide surface.

U2 - 10.1016/j.cplett.2005.07.039

DO - 10.1016/j.cplett.2005.07.039

M3 - Article

AN - SCOPUS:23944511108

SN - 0009-2614

VL - 412

SP - 434

EP - 438

JO - Chemical Physics Letters

JF - Chemical Physics Letters

IS - 4-6

ER -

Methylsilane on Cu(1 1 1): A MDS study of the formation of the surface silicide

Abstract

ASJC Scopus subject areas

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