Methylsilane on Cu(1 1 1), a STM study of the (√3×√3) R30°-Cu2Si surface silicide

Hervé Ménard, Andrew B. Horn, Steven P. Tear

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12 Citations (Scopus)


Scanning tunnelling microscopy has been used to investigate the surface structure of the (3×3)R30°-Cu2Si surface silicide formed on Cu(1 1 1) after adsorption of methylsilane at 595 K. The STM images have shown the presence of a domain wall network on the surface, in the form of a 0.1 Å variation in height on the lateral scale of a minimum of 26 Å. The interpretation of the STM images has indicated that the areas between the domains walls are associated with silicon and copper atoms both residing in either fcc or hcp three-fold hollow sites, whilst the domain wall is a result of an abrupt change enhanced with some electronic contribution.

Original languageEnglish
Pages (from-to)47-52
Number of pages6
JournalSurface Science
Issue number1-2
Early online date21 Apr 2005
Publication statusPublished - 1 Jul 2005


  • Compound formation
  • Copper
  • Low index single crystal surfaces
  • Scanning tunnelling microscopy
  • Silicides
  • Surface structure, morphology, roughness, and topography


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