On-mask mismatch resistor structures for the characterisation of maskmaking capability

S. Smith; A Tsiamis; M. McCallum; A.C. Hourd; J.T.M. Stevenson; A.J. Walton; S. Enderling

doi:10.1109/ICMTS.2008.4509343

On-mask mismatch resistor structures for the characterisation of maskmaking capability

S. Smith, A Tsiamis, M. McCallum, A.C. Hourd, J.T.M. Stevenson, A.J. Walton, S. Enderling

Research output: Chapter in Book/Report/Conference proceeding › Other chapter contribution

4 Citations (Scopus)

Abstract

This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.

Original language	English
Title of host publication	IEEE International Conference on Microelectronic Test Structures
Publisher	IEEE Computer Society
Pages	228-232
Number of pages	5
ISBN (Electronic)	9781424418015
ISBN (Print)	9781424418008
DOIs	https://doi.org/10.1109/ICMTS.2008.4509343
Publication status	Published - 2008
Event	IEEE Conference on Microelectronic Test Structures - Edinburgh, United Kingdom Duration: 24 Mar 2008 → 27 Mar 2008

Conference

Conference	IEEE Conference on Microelectronic Test Structures
Country/Territory	United Kingdom
City	Edinburgh
Period	24/03/08 → 27/03/08

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10.1109/ICMTS.2008.4509343

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title = "On-mask mismatch resistor structures for the characterisation of maskmaking capability",

abstract = "This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.",

author = "S. Smith and A Tsiamis and M. McCallum and A.C. Hourd and J.T.M. Stevenson and A.J. Walton and S. Enderling",

year = "2008",

doi = "10.1109/ICMTS.2008.4509343",

language = "English",

isbn = "9781424418008",

pages = "228--232",

booktitle = "IEEE International Conference on Microelectronic Test Structures",

publisher = "IEEE Computer Society",

note = "IEEE Conference on Microelectronic Test Structures ; Conference date: 24-03-2008 Through 27-03-2008",

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Smith, S, Tsiamis, A, McCallum, M, Hourd, AC, Stevenson, JTM, Walton, AJ & Enderling, S 2008, On-mask mismatch resistor structures for the characterisation of maskmaking capability. in IEEE International Conference on Microelectronic Test Structures. IEEE Computer Society, pp. 228-232, IEEE Conference on Microelectronic Test Structures, Edinburgh, United Kingdom, 24/03/08. https://doi.org/10.1109/ICMTS.2008.4509343

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T1 - On-mask mismatch resistor structures for the characterisation of maskmaking capability

AU - Smith, S.

AU - Tsiamis, A

AU - McCallum, M.

AU - Hourd, A.C.

AU - Stevenson, J.T.M.

AU - Walton, A.J.

AU - Enderling, S.

PY - 2008

Y1 - 2008

N2 - This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.

AB - This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.

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M3 - Other chapter contribution

AN - SCOPUS:51349151292

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BT - IEEE International Conference on Microelectronic Test Structures

PB - IEEE Computer Society

T2 - IEEE Conference on Microelectronic Test Structures

Y2 - 24 March 2008 through 27 March 2008

ER -

On-mask mismatch resistor structures for the characterisation of maskmaking capability

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