On-mask mismatch resistor structures for the characterisation of maskmaking capability

S. Smith, A Tsiamis, M. McCallum, A.C. Hourd, J.T.M. Stevenson, A.J. Walton, S. Enderling

    Research output: Chapter in Book/Report/Conference proceedingOther chapter contribution

    4 Citations (Scopus)

    Abstract

    This paper presents results from the use of electrical measurements to investigate dimensional mismatch in an advanced photomask process. Test structures consisting of matched pairs of Kelvin resistors have been measured and the results analysed to obtain information about the capability of the mask making process. The mask plate used in this work has an array of over 350 sets of mismatch test structures, providing an unprecedented volume of data. A second mask, which was underexposed, has allowed the relationship between mismatch and the location of nearby mask writing pattern boundaries to be investigated for the first time.
    Original languageEnglish
    Title of host publicationIEEE International Conference on Microelectronic Test Structures
    PublisherIEEE Computer Society
    Pages228-232
    Number of pages5
    ISBN (Electronic)9781424418015
    ISBN (Print)9781424418008
    DOIs
    Publication statusPublished - 2008
    EventIEEE Conference on Microelectronic Test Structures - Edinburgh, United Kingdom
    Duration: 24 Mar 200827 Mar 2008

    Conference

    ConferenceIEEE Conference on Microelectronic Test Structures
    CountryUnited Kingdom
    CityEdinburgh
    Period24/03/0827/03/08

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  • Cite this

    Smith, S., Tsiamis, A., McCallum, M., Hourd, A. C., Stevenson, J. T. M., Walton, A. J., & Enderling, S. (2008). On-mask mismatch resistor structures for the characterisation of maskmaking capability. In IEEE International Conference on Microelectronic Test Structures (pp. 228-232). IEEE Computer Society. https://doi.org/10.1109/ICMTS.2008.4509343