Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology

N. Vourdas, D. Kontziampasis, G. Kokkoris, V. Constantoudis, A. Goodyear, A. Tserepi, M. Cooke, E. Gogolides

Research output: Contribution to journalArticlepeer-review

54 Citations (Scopus)

Abstract

Fabrication of periodic nanodot or nanocolumn arrays on surfaces is performed by top-down lithographic procedures or bottom-up self-assembly methods, which both make use of plasma etching to transfer the periodic pattern. Could plasma etching alone act as an assembly–organization method to create the pattern and then transfer it to the substrate? We present data that support this idea and propose a mechanism of periodicity formation where etching and simultaneous deposition take place.
Original languageEnglish
Article number085302
JournalNanotechnology
Volume21
Issue number8
DOIs
Publication statusPublished - 25 Jan 2010

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