Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology

TY - JOUR

T1 - Plasma directed assembly and organization

T2 - bottom-up nanopatterning using top-down technology

AU - Vourdas, N.

AU - Kontziampasis, D.

AU - Kokkoris, G.

AU - Constantoudis, V.

AU - Goodyear, A.

AU - Tserepi, A.

AU - Cooke, M.

AU - Gogolides, E.

PY - 2010/1/25

Y1 - 2010/1/25

N2 - Fabrication of periodic nanodot or nanocolumn arrays on surfaces is performed by top-down lithographic procedures or bottom-up self-assembly methods, which both make use of plasma etching to transfer the periodic pattern. Could plasma etching alone act as an assembly–organization method to create the pattern and then transfer it to the substrate? We present data that support this idea and propose a mechanism of periodicity formation where etching and simultaneous deposition take place.

AB - Fabrication of periodic nanodot or nanocolumn arrays on surfaces is performed by top-down lithographic procedures or bottom-up self-assembly methods, which both make use of plasma etching to transfer the periodic pattern. Could plasma etching alone act as an assembly–organization method to create the pattern and then transfer it to the substrate? We present data that support this idea and propose a mechanism of periodicity formation where etching and simultaneous deposition take place.

UR - https://www.scopus.com/pages/publications/76249123223

U2 - 10.1088/0957-4484/21/8/085302

DO - 10.1088/0957-4484/21/8/085302

M3 - Article

SN - 0957-4484

VL - 21

JO - Nanotechnology

JF - Nanotechnology

IS - 8

M1 - 085302

ER -