Plasma Directed Assembly and Organization: Formation of polymeric nanodots and silicon nanopillars

Athanasios Smyrnakis, Dimitrios Kontziampasis, Aggelos Zeniou, Angeliki Tserepi, Evangelos Gogolides (Lead / Corresponding author)

Research output: Contribution to journalMeeting abstractpeer-review


Periodic, well-defined, features in the nano-scale (dots, pillars, pores etc) are essential in several science and technology fields (photonics, hard disk drives, catalysis, biology). Top-down nano-lithographic processes, as well as self-assembly processes (block copolymer, colloidal particles) are used for the fabrication of such features. Here, we demonstrate an assembly-organization method to both create the nanodot pattern on any non-specialty commercial polymer, and then transfer it to the subsequent silicon substrate [1,2]. First we perform a simple, fast, low ion-energy oxygen plasma etching step in a helicon plasma source. This creates polymer nanodots on the polymer film, due to simultaneous co-deposition of etch inhibitors from the reactor walls. Pattern transfer of the polymer nanodots on silicon has been subsequently performed by either SF6/O2 based high-density plasma at cryogenic temperatures, or a gas mixture of SF6, C4F8 and O2 at room temperature, leading to the fabrication of high aspect ratio silicon nanopillars. Possible applications are discussed.
Original languageEnglish
Article numberMR1.00002
Number of pages1
JournalBulletin of the American Physical Society
Issue number7
Publication statusPublished - 7 Oct 2010
Event63rd Annual Gaseous Electronics Conference and 7th International Conference on Reactive Plasmas - Paris, France
Duration: 4 Oct 20108 Oct 2010


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