Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer

J A Cairns, C W Liu, A C Hourd, Robert Keatch, B Lawrenson, Robert Keatch

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)
    Original languageEnglish
    Title of host publication Thin films
    EditorsSP Baker, CA Ross, PH Townsend, CA Volkert, P Borgesen
    Place of PublicationPittsburgh
    PublisherMaterials Research Society
    Pages239-244
    Number of pages6
    ISBN (Print)1-55899-257-X
    Publication statusPublished - 1995
    EventMRS Fall Meeting. Symposium B2: Thin Films - Stresses and Mechanical Properties V - Boston, Mass., United States
    Duration: 28 Nov 19942 Dec 1994

    Conference

    ConferenceMRS Fall Meeting. Symposium B2: Thin Films - Stresses and Mechanical Properties V
    CountryUnited States
    CityBoston, Mass.
    Period28/11/942/12/94

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