Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer

J A  Cairns; C W  Liu; A C Hourd; Robert Keatch; B  Lawrenson; Robert Keatch

Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer

J A Cairns, C W Liu, A C Hourd, Robert Keatch, B Lawrenson, Robert Keatch

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Thin films
Editors	SP Baker, CA Ross, PH Townsend, CA Volkert, P Borgesen
Place of Publication	Pittsburgh
Publisher	Materials Research Society
Pages	239-244
Number of pages	6
ISBN (Print)	1-55899-257-X
Publication status	Published - 1995
Event	MRS Fall Meeting. Symposium B2: Thin Films - Stresses and Mechanical Properties V - Boston, Mass., United States Duration: 28 Nov 1994 → 2 Dec 1994

Conference

Conference	MRS Fall Meeting. Symposium B2: Thin Films - Stresses and Mechanical Properties V
Country/Territory	United States
City	Boston, Mass.
Period	28/11/94 → 2/12/94

Cite this

@inproceedings{c42aa26b47a744979cefffabfb978ac2,

title = "Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer",

author = "Cairns, {J A} and Liu, {C W} and Hourd, {A C} and Robert Keatch and B Lawrenson and Robert Keatch",

year = "1995",

language = "English",

isbn = "1-55899-257-X",

pages = "239--244",

editor = "SP Baker and CA Ross and PH Townsend and CA Volkert and P Borgesen",

booktitle = "Thin films",

publisher = "Materials Research Society",

note = "MRS Fall Meeting. Symposium B2: Thin Films - Stresses and Mechanical Properties V ; Conference date: 28-11-1994 Through 02-12-1994",

}

Cairns, JA, Liu, CW, Hourd, AC, Keatch, R, Lawrenson, B & Keatch, R 1995, Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer. in SP Baker, CA Ross, PH Townsend, CA Volkert & P Borgesen (eds), Thin films. Materials Research Society, Pittsburgh, pp. 239-244, MRS Fall Meeting. Symposium B2: Thin Films - Stresses and Mechanical Properties V, Boston, Mass., United States, 28/11/94.

Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer. / Cairns, J A ; Liu, C W ; Hourd, A C et al.
Thin films. ed. / SP Baker; CA Ross; PH Townsend; CA Volkert; P Borgesen. Pittsburgh: Materials Research Society, 1995. p. 239-244.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer

AU - Cairns, J A

AU - Liu, C W

AU - Hourd, A C

AU - Keatch, Robert

AU - Lawrenson, B

AU - Keatch, Robert

PY - 1995

Y1 - 1995

UR - http://discovery.dundee.ac.uk/portal/en/research/potential-limitations-of-conventional-photomasks-due-to-inherent-internal-stress--the-need-for-an-alternative-opaque-layer(c42aa26b-47a7-4497-9cef-ffabfb978ac2).html

M3 - Conference contribution

SN - 1-55899-257-X

SP - 239

EP - 244

BT - Thin films

A2 - Baker, SP

A2 - Ross, CA

A2 - Townsend, PH

A2 - Volkert, CA

A2 - Borgesen, P

PB - Materials Research Society

CY - Pittsburgh

T2 - MRS Fall Meeting. Symposium B2: Thin Films - Stresses and Mechanical Properties V

Y2 - 28 November 1994 through 2 December 1994

ER -

Potential limitations of conventional photomasks due to inherent internal stress - The need for an alternative opaque layer

Conference

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