Structure-related strain and stress in thin hydrogenated microcrystalline silicon films

K. Christova, S. Alexandrova, A. Abramov, E. Valcheva, B. Ranguelov, C. Longeaud, S. Reynolds, P. Roca I Cabarrocas

    Research output: Contribution to journalConference article

    2 Citations (Scopus)

    Abstract

    The stress/strain relation for hydrogenated microcrystalline silicon (μc-Si:H) films in the thickness range 10 to 200 nm was studied. It was found from wafer curvature measurements that all deposited films exhibit compressive intrinsic stress, which decreases with film thickness. This finding is in agreement with the stress level seen from the shifts in Raman spectra. The strain was approached through the Raman Mechanical Coefficient for the thin films and was estimated to be -1.4×10-5 (cm-1/MPa). The Raman spectra indicated highly crystalline films. The deconvolution of the spectra into Lorentzian components revealed inclusion of defective nanocrystallites and amorphous phase as well. The fractions of the different constituents were estimated. The contribution of the defective nanocrystallites to the overall stress in the films has been interpreted.

    Original languageEnglish
    Article number012056
    Number of pages9
    JournalJournal of Physics: Conference Series
    Volume253
    Issue number1
    DOIs
    Publication statusPublished - 2010
    EventProgress in Solid State and Molecular Electronics, Ionics and Photonics, 16 ISCMP - Varna, Bulgaria
    Duration: 29 Aug 20103 Sep 2010

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