Structure-related strain and stress in thin hydrogenated microcrystalline silicon films

K. Christova, S. Alexandrova, A. Abramov, E. Valcheva, B. Ranguelov, C. Longeaud, S. Reynolds, P. Roca I Cabarrocas

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The stress/strain relation for hydrogenated microcrystalline silicon (μc-Si:H) films in the thickness range 10 to 200 nm was studied. It was found from wafer curvature measurements that all deposited films exhibit compressive intrinsic stress, which decreases with film thickness. This finding is in agreement with the stress level seen from the shifts in Raman spectra. The strain was approached through the Raman Mechanical Coefficient for the thin films and was estimated to be -1.4×10-5 (cm-1/MPa). The Raman spectra indicated highly crystalline films. The deconvolution of the spectra into Lorentzian components revealed inclusion of defective nanocrystallites and amorphous phase as well. The fractions of the different constituents were estimated. The contribution of the defective nanocrystallites to the overall stress in the films has been interpreted.

Original languageEnglish
Article number012056
Number of pages9
JournalJournal of Physics: Conference Series
Issue number1
Publication statusPublished - 2010
EventProgress in Solid State and Molecular Electronics, Ionics and Photonics, 16 ISCMP - Varna, Bulgaria
Duration: 29 Aug 20103 Sep 2010


Cite this

Christova, K., Alexandrova, S., Abramov, A., Valcheva, E., Ranguelov, B., Longeaud, C., Reynolds, S., & Roca I Cabarrocas, P. (2010). Structure-related strain and stress in thin hydrogenated microcrystalline silicon films. Journal of Physics: Conference Series, 253(1), [012056].