Surface electronic structure of two- and three-dimensional holmium silicide on Si(111)

Charles Woffinden, Christopher Eames, Hervé Ménard, Steve P. Tear, Andrew Pratt (Lead / Corresponding author)

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Abstract

The surface electronic structure of two- and three-dimensional Ho silicides grown on Si(111) has been studied with the techniques of metastable de-excitation spectroscopy (MDS) and ultraviolet photoemission spectroscopy. Electronic structure differences between the two cases are examined, and the extreme sensitivity of MDS to the surface density of states (DOS) allows a direct comparison between deconvolved spectra and ab initio density-functional theory calculations. This comparison shows a good agreement between the DOS calculated for the Si (111) -1×1-Ho structure and MDS data obtained from an almost-complete layer of two-dimensional Ho silicide. The dominant role of the topmost silicon bilayer in determining the surface electronic properties is revealed.

Original languageEnglish
Article number245406
Number of pages8
JournalPhysical Review B: Condensed Matter and Materials Physics
Volume79
Issue number24
Early online date5 Jun 2009
DOIs
Publication statusPublished - 15 Jun 2009

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